ANNOUNCEMENT .VELDHOVEN，THE NETHERLANDS，JANUARY 12 0 2 4

A license for the shipment of NXT:2050i and NXT:2100ilithography systems in 2023 hasrecently been partially revoked by the Dutch government, impacting a small number ofcustomers in China

We do not expect the current revocation of our export license or the latest U.S. export controlrestrictions to have a material impact on our financial outlook for 2023

In recent discussions with the US government,ASML has obtained further clarification of thescope and impact of the US export control regulations. The latest US export rules (publishedOctober 17,2023)impose restrictions on certain mid critical DUV immersion lithographysystems for a limited number of advanced production facilities.

ASML is fully committed to comply with all applicable laws and regulations including exportcontrol legislation in the countries in which we operate.

TWINSCAN NXT:2050i

通过将高生产率与亘古未有的笼罩性能相连系，该系统知足了多种图案化要求，为在先进逻辑和 DRAM 节点制造 300 毫米晶圆提供了经济高效的解决计划。

TWINSCAN NXT:2100i

TWINSCAN NXT:2100i 是TWINSCAN NXT:2050i的后继产品。其新的硬件和软件立异使单机笼罩率提高了 10% (0.9 nm)，匹配机笼罩率提高了 13% (1.3 nm)。

NXT:2100i 接纳了新的镜头畸变使用器 ，为芯片制造商提供了亘古未有的校正能力。它使系统能够改善 DUV-EUV 交织匹配叠加。通过将 4 色丈量增添到 12 色以及在晶圆丈量侧添加更多瞄准标记丈量，可以提高瞄准精度。种种软件算法也已更新，以提供刷新的场间和场内叠加控制。

ASML声明如下：